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Chapter1
ExecutiveSummary
TheMarket1-1
IntroductiontotheU.S.ElectronicsChemicalsMarket1-1
TheProcessChain1-3
DriversandRestraints1-4
KeyMarketDrivers1-4
KeyMarketRestraints1-4
MarketIssues1-4
MarketandTechnicalTrends1-5
MajorResearchFindings1-5
Chapter2
IndustryDefinitionandChallenges
IndustryChallenges2-1
CustomizationofProductstoSuitSpecificCustomerNeeds2-2
UpGradationofTechnology-InvestinginResearchandDevelopment2-2
DecreaseinPriceinEnd-userMarket2-2
RawMaterialSupplyChain2-2
LargeMultinationalCustomersForcingElectronics
ChemicalsManufacturerstoExpandGlobally2-3
EnvironmentalRegulations2-3
DefinitionandGlossaryofTerms2-4
ListofAbbreviations2-7
Chapter3
TotalU.S.ElectronicChemicalsMarket
IntroductiontoElectronicChemicals3-1
ICMarket3-3
MarketEngineeringMeasurements3-9
MarketForecastandTrends3-10
MarketDrivers3-10
GrowthintheDemandofPersonalComputersandMobilePhones3-10
IncreasedDemandforNewerMicrochipsDrivesGrowth3-11
IndustryConsolidationFavorsMarketGrowth3-11
MarketRestraints3-11
CompetitionfromChinaLimitsMarketGrowth3-12
BargainingPoweroftheCustomersLimitsProfitMargins,3-12
NewTechnologyDeviceAdoptionRateLimitsMarketGrowth3-13
RevenueForecasts3-13
CompetitiveAnalysis3-16
CompetitiveStructure3-16
Porter'sFiveForceModel3-17
Rivalry3-17
ThreatofSubstitutes3-18
BuyerPower3-19
SupplierPower3-19
StrategicRecommendations3-20
ImportantTipsforMakingStrategicDecisions3-21
StrategytoImproveProfitMargin3-22
StrategytoImproveROI3-22
StrategytoCountertheComplexityinNewMaterialIntegration3-22
StrategytowardGlobalExpansion3-23
TechnologyInnovationandProductInnovation3-23
CompanyAnalysis3-23
AirProductsandChemicalsInc3-23
Introduction3-23
ElectronicsandPerformanceMaterialsDivision3-24
Sales3-24
Personnel/Employees3-27
Honeywell3-27
ProductRange3-28
Sales3-28
Employees3-29
GeneralChemicalPerformanceProductsLLC3-30
GCC3-30
ProductRange3-30
MallinkrodtBaker3-31
ProductRange3-31
RohmandHaas3-31
ProductRange3-32
Sales3-32
JSRCorporation3-35
ProductRange3-35
Personnel3-36
Sales3-36
TOK3-37
ProductRange3-37
Sales3-37
ShinEtsu3-38
ProductRange3-39
Sales3-40
CabotMicroelectronics3-41
ProductRange3-41
Personnel3-42
Sales3-42
HitachiChemicalCompany3-43
ProductRange3-44
Personnel3-44
PlanarSolutions3-46
CompanyOverview3-46
ProductRange3-46
FinancialInformation3-46
DowChemicals3-46
ProductRange3-47
Personnel3-47
ATMI3-47
Chapter4
U.S.WetProcessChemicalsMarket
MarketOverviewandDefinition4-1
MarketOverview4-1
Acids4-1
Bases4-3
Solvents4-4
DryEtchingversusWetEtching4-5
MarketEngineeringMeasurements4-7
MarketForecastandTrends4-8
Challenges;DriversandRestraints4-8
Challenges4-8
ConstantlyChangingDeviceGeometries4-8
ExpectationofExtremeCleanliness4-9
GovernmentRegulation4-9
UncertaintyonROIlimitsR&DInvestments4-9
MarketDrivers4-9
IncreaseinDemandforSemiconductorchipsdrivesgrowth4-10
ComplexChipTechnologiesWarrantUsage4-10
Closeassociationbetweenthesuppliersandsemiconductor
manufacturersforproductandprocessdevelopmentactivities4-11
UseofWetChemicalsforCleaningandEtchingApplicationsdrivesthegrowth4-11
MarketRestraints4-11
ShifttowardDryEtchingReducesDemand4-12
AsianFactor4-12
IncreaseintheManufacturingCostandLoweringPrice
MarginofWetChemicalsRestrainsRevenues4-13
RevenueForecasts4-13
MarketandTechnologyTrends4-16
TechnologyTrends4-16
PricingTrend4-16
OneStopShopforalltheWetChemicals4-17
AlternativeTechnology4-17
AnalysisbyProductType4-17
Acids4-17
Bases4-19
Solvents4-20
CompetitiveAnalysis4-22
CompetitionStructure4-22
Consortium/JointVentures/MergersandAcquisitions4-23
CompetitiveFactors4-23
Productinnovation4-23
MarketShareAnalysis4-24
Chapter5
U.S.PhotoresistMarket
MarketOverviewandDefinition5-1
MarketOverview5-1
MarketEngineeringMeasurements5-4
MarketForecastandTrends5-6
Challenges;DriversandRestraints5-6
Challenges5-6
InvestmentinNewTechnology5-6
BargainingPressurefromCustomers5-7
Drivers5-7
ChangesinChipManufacturingProcessDrivestheGrowth5-7
IncreaseinDemandintheEnd-userMarketImpactsRevenues5-8
IncreaseinDemandforNewerTypeResistDrivestheGrowth5-8
Restraints5-8
RelocationtoAsianCountriesReducesDemand5-8
DelayinIntroductionorOutrightRejectionofthe
NewTechnologybytheChipManufacturers5-9
RevenueForecasts5-9
Trends5-12
Technology5-12
DoublePatternLithography5-13
PricingTrend5-13
CloseAssociationbetweenCustomersandManufacturers5-13
AlternativeTechnology5-13
AnalysisbyProductType5-14
DUV1935-14
MarketOverview5-14
MarketForecasts5-14
IandGLineMarket5-15
MarketOverview5-15
Deep-UVPhotoresist5-17
MarketOverview5-17
MarketForecasts5-17
CompetitiveAnalysis5-18
CompetitiveStructure5-18
MergersandAcquisition/JointVentures/Consortium5-19
MarketShareAnalysis5-20
Chapter6
U.S.ChemicalMechanicalPlanarizationMarket
MarketOverviewandDefinition6-1
MarketOverview6-1
MarketEngineeringMeasurements6-8
MarketForecastandTrends6-9
Challenges;DriversandRestraints6-9
Challenges6-9
MarketFragmentation6-9
Patent6-10
Drivers6-10
ComplexityintheChipTechnologyFavorsUsage6-10
IncreaseinCMPAdoptionRateFavorsGrowth6-11
CopperInterconnects6-11
Restraints6-11
IncreasingMarketFocusonAsiaDeceleratesGrowth6-12
GrowingUseof300mmWaferTechnologyImpedesGrowth6-12
GrowthProductionVolumeallowsEconomiesofScale6-12
EquipmentCompaniesdevelopingNon-CMPTechnology
fortheFutureAffectsGrowth6-13
RevenueForecasts6-13
Trends6-16
Technology6-16
ShiftfromTungstentoCopper6-16
IncreaseinProductRange6-16
DecreaseinAbrasivenessofCMPSlurry6-17
DevelopmentofeCMP6-17
Price6-17
AnalysisbyProductType6-17
CompetitiveAnalysis6-23
CompetitiveStructure6-23
MergersandAcquisition/JointVentures/Alliances6-24
CompetitiveFactors6-25
MarketShareAnalysis6-25
SlurryMarket6-25
PadMarket6-27
Chapter7
U.S.LowKDielectricMarket
MarketOverviewandDefinition7-1
MarketOverview7-1
MarketEngineeringMeasurements7-3
MarketForecastandTrends7-4
Challenges;DriversandRestraints7-4
Challenges7-4
AccommodatingLowKmaterialsin32nm7-4
IntegrationIssues7-5
Drivers7-5
TrendTowardsComplexandSmallerChipsDrivesGrowth7-5
IntegrationandLow-costOwnershipDrivesGrowth7-5
Restraints7-6
RelocationtoAsianRegionsRestraintsGrowth7-6
RevenueForecasts7-6
Trends7-9
TechnologicalTrends7-9
MarketTrends7-10
HighKDielectric7-10
ROHPartnerswithUPChemicalCo.7-11
ROHLicensesALDtechnologyofHarvardUniversity7-11
AnalysisbyProductType7-11
Spin-onDielectric7-11
CVDDielectric7-13
CompetitiveAnalysis7-14
CompetitiveStructure7-14
CompetitiveFactors7-15